NIST AML Nanofab Group
Click here to visit the Internal NIST AML Nanofab webpage. (NIST staff only)
GOALS
The NIST Advanced Measurement Laboratory (AML) Nanofabrication Facility (NF) will: enable fabrication of prototypical nanoscale test structures, measurement instruments, standard reference materials, electronic devices, MEMS, and bio-devices critical to NIST's Strategic Focus Areas (Nanotechnology, Homeland Security, Biosystems and Health) and the Nation's Nanotechnology Needs; provide access to expensive nanofabrication tools, technologies, and expertise in a shared-access, shared-cost environment to NIST and its partners; foster internal collaboration in nanotechnology across NIST's Laboratories; and foster external collaboration in nanotechnology with NIST's partners.
CUSTOMER NEEDS
To continue to respond to U.S. science and industry's needs for more sophisticated measurements and standards in the face of heightened global competition, NIST is constructing one of the most technologically advanced facilities in the world - the Advanced Measurement Laboratory, or AML. The NIST Nanofabrication Facility (NF) is one of five buildings in the AML at the Gaithersburg, MD, campus. The AML Nanofabrication Facility will provide researchers at NIST working on a variety of semiconductor and other nanotechnology research the ability to fabricate prototypical nanoscale test structures, measurement instruments, standard reference materials, and electronic devices.
TECHNICAL STRATEGY
The AML contains 2 above ground instrument buildings, 2 completely below ground metrology buildings, and 1 class 100 clean room building which will house the NIST AML Nanofabrication Facility. The AML will provide NIST with superior vibration, temperature and humidity control, and air cleanliness. The NIST AML NF has approximately 18,000 sq. ft. of Class 100, raised floor, bay and chase, clean room space. NIST has invested in a complete suite of new equipment (capable of processing 150 mm wafers) that will be installed over the upcoming year. This includes furnaces (2 banks of 4 tubes each), LPCVD (poly, nitride, LTO), rapid thermal annealer, 3 reactive ion etchers (SF6/O2, Metal, Deep), 3 metal deposition tools (thermal, e-beam, sputterer), contact lithography (front- and back-side alignment), e-beam lithography, focused ion beam, and numerous monitoring tools (FESEM, spectroscopic ellipsometer, contact profilometer, 4-point probe, microscope with image capture, etc.).
The NF will be operated as shared access user facility. This means that the staff of NIST and its partners, subject to provisions, training, and user fees, will be permitted to operate the equipment independently. The tools will be operated in a manner such that a wide variety of materials can be processed. The facility will be directed by NIST's Semiconductor Electronics Division. Unlike other NFs, the AML NF is unique in that, being located at NIST, it is next to the most advanced metrology tools in the world, and its focus will be on fabricating nanoscale structures necessary for metrology and standards in support of the semiconductor industry, nanotechnology, biotechnology, and homeland security.
It is anticipated that the fit up of the facility and equipment will be completed by the third quarter of FY05, with the facility becoming fully operational by the first quarter of FY06.