Figure SG.2.1.
Top view of cantilever test
structure used to measure
strain gradient.
To
obtain the following
measurements, consult ASTM
standard test method E 2246
entitled
"Standard Test
Method for Strain Gradient
Measurements of Thin,
Reflecting Films
Using an
Optical Interferometer" and
NISTIR 7291 entitled
"MEMS Length and
Strain
Round Robin Results
with Uncertainty Analysis."
filename of 3-D data set
(optional) =
filename of 2-D data
traces (optional) =
material =
Poly1
Poly2
stacked Poly1 and Poly2
SiC-2
SiC-3
design length =
µm
which cantilever on the
round robin test chip ?
First Second
Third
magnification =
×
orientation =
0 degree
90 degree
x-calibration
factor (for the given
magnification)
= calx
=
interferometer's maximum
field of view (for the given
magnification) =
interx
=
µm
one sigma uncertainty in a
ruler measurement (for the
given mag) =
σxcal
=
µm
resolution of the
interferometer in the
x-direction
=
xres
=
µm
z-calibration factor
(for the given
magnification)
= calz
=
certified value of step
height standard =
cert
=
µm
certified one sigma
uncertainty of certified
value of step height
standard =
σcert
=
µm
maximum range of the six
calibration measurements
taken before the data
session or after the data
session (whichever is
larger) =
zrepeat
=
µm
Is the mean value of the six
calibration measurements
used to obtain
zrepeat
greater than or less than
the mean value of all
twelve calibration measurements?
greater than
less
than
(Therefore,
ameanz =
.)
drift in the calibrated data
(i.e., the absolute value of
the mean value of the six
calibration measurements
taken before the data
session minus the mean value
after the data session) =
zdrift =
µm
percent quoted by
interferometer manufacturer
for the maximum deviation
from linearity of the data
scan over the total scan
range divided by 1 % such
that it is unitless =
zperc
=
resolution of the
interferometer in the
z-direction
=
zres
=
µm
peak-to-valley roughness of
a flat and leveled surface
of the sample material
calculated to be the average
of three or more
measurements, each
measurement of which is
taken from a different 2-D
data trace =
Rtave
=
µm
surface roughness of a flat
and leveled surface of the
sample material calculated
to be the average of three
or more measurements, each
measurement of which is
taken from a different 2-D
data trace =
Rave
=
µm
alignment ensured ?
Yes
No
data leveled ?
Yes
No
Is this cantilever
exhibiting stiction ?
Yes
No
If it is exhibiting
stiction, do not fill out
the remainder of this form.
INPUTS
(uncalibrated values from
Trace "a" or "e"):
x1max
(i.e., x1upper)
=
µm
x1min
(i.e., x1lower)
=
µm
(x1min >
x1max)
INPUTS
(uncalibrated values from
Trace "b")
x1
=
µm z1
=
µm
(x1ave
< x1 *
calx)
x2
=
µm z2
=
µm
(x1ave
< x2 *
calx)
x3
=
µm z3
=
µm
(x1ave
< x3 *
calx)
INPUTS
(uncalibrated values from
Trace "c")
x1
=
µm z1
=
µm
(x1ave
< x1 *
calx)
x2
=
µm z2
=
µm
(x1ave
< x2 *
calx)
x3
=
µm z3
=
µm
(x1ave
< x3 *
calx)
INPUTS
(uncalibrated values from
Trace "d")
x1
=
µm z1
=
µm
(x1ave
< x1 *
calx)
x2
=
µm z2
=
µm
(x1ave
< x2 *
calx)
x3
=
µm z3
=
µm
(x1ave
< x3 *
calx)
OUTPUTS (calibrated
values):
x1ave
=
µm
s =
from Trace "c"
s = 1 (for downward
bending cantilevers or
if data was taken from the
bottom of an upward bending
cantilever)
s = −1 (for upward
bending cantilevers unless
data was taken from the
bottom of an upward bending
cantilever)
Rint
=
µm from
Trace "b"
a
=
µm from
Trace "b"
b
=
µm from
Trace "b"
sg =
m−1
from Trace "b"
Rint
=
µm from
Trace "c"
a
=
µm from
Trace "c"
b
=
µm from
Trace "c"
sg =
m−1
from Trace "c"
uW =
m−1 from
two or three traces
uRave =
m−1 from
Trace "c"
unoise =
m−1 from
Trace "c"
uxcal =
m−1
from Trace "c"
ucert =
m−1
from Trace "c"
urepeat =
m−1
from Trace "c"
udrift =
m−1
from Trace "c"
ulinear =
m−1
from Trace "c"
uzres =
m−1
from Trace "c"
uxres =
m−1
from Trace "c"
uc
=
SQRT[uW2
+
uRave2
+
unoise2
+ uxcal2
+
ucert2
+
urepeat2
+ udrift2
+ ulinear2
+ uzres2
+
uxres2]
uc
=
m−1 from
two or three traces
Rint
=
µm from
Trace "d"
a
=
µm from
Trace "d"
b
=
µm from
Trace "d"
sg =
m−1
from Trace "d"
Modify
the input data, given the
information supplied in any
flagged statement below, if
applicable, then
recalculate:
1.
Please fill out the entire
form.
2.
For the round robin test
chip, the design length
should be 400, 450, 500,
550, 600, 650, 700, 750, or
800 mm.
3.
Is the magnification
appropriate given the design
length ?
4.
Magnifications at or less
than 2.5×
shall not be used.
5.
Is 0.95 < calx < 1.05
but not equal to "1"?
If not, recheck your x-calibration.
6.
The value for
interx should be between
0
µm
and 1500
µm.
7.
The value for
σxcal should
be between 0
µm
and 4
µm.
8.
The value for
xres should
be between 0
µm
and 1.57
µm.
9.
Is 0.95 < calz < 1.05
but not equal to "1"?
If not, recheck your z-calibration.
10.
The value for cert
should be greater than 0 µm
and less than 25 µm.
11.
The value for
σcert
should be between 0 µm and
0.100 µm.
12.
The value for
zrepeat
should be between 0 µm and
0.070 µm.
13.
The value for
zdrift
should be between 0 µm and
0.010 µm.
14.
The value for
zperc
should be between 0 and 3.
15.
The value for zres
should be greater than 0 µm
and less than or equal to
0.005 µm.
16.
The value for
Rtave
should be between 0 µm and
0.100 µm and greater than
Rave.
17.
The value for
Rave
should be between 0 µm and
0.020 µm.
18.
Alignment has not been
ensured.
19.
Data has not been leveled.
20.
x1min should
be greater than x1max.
21.
The calibrated values for
x1min and
x1max are
greater than 10 µm apart.
22.
In Trace "b," the calibrated
values of x1,
x2, and x3
should be > x1ave.
23.
In Trace "c," the calibrated
values of x1,
x2, and x3
should be > x1ave.
24.
In Trace "d," the calibrated
values of x1,
x2, and x3
should be > x1ave.
25.
In Traces "b," "c," and "d,"
the value for s is
not the same.
Return to
Main MEMS Calculator Page.
NIST
is an agency of the
U.S. Commerce Department
The
Semiconductor Electronics
Division is within the
Electronics and Electrical
Engineering Laboratory.
The
MNT Project
(http://www.eeel.nist.gov/812/MNT/index.html)
is within the Enabling
Devices and ICs Group.
Date created: 12/4/2000
Last updated:
1/11/2008