Data
analysis sheet for step height
measurements from one 3-D
data set.
a) b)
Figure SH.1.1.For a CMOS step height test structure: a) a
design rendition and b) a
cross-section.
To obtain the
following measurements, consult SEMI
standard test method MS2 entitled "Test Method for Step-Height
Measurements of Thin, Reflecting
Films Using an Optical
Interferometer."
Preliminary
INPUTS
Data Set Prelims
Description
1
proc =
which process?
2
quad =
which quad of test
structures, if
applicable?
3
0°
orientation
4
×
magnification
5
Yes
alignment ensured?
6
Yes
data leveled?
7
µm
certified value of step
height standard
8
µm
certified one sigma
uncertainty of certified
value of step height
standard
9
µm
maximum uncalibrated
range of the six
calibration measurements
taken before the data
session or after the
data session (whichever
is larger)
10
µm
the uncalibrated average
of the six calibration
measurements from which
zrepeat
was found
11
µm
uncalibrated drift in
the calibrated data
(i.e., the absolute
value of the mean value
of the six calibration
measurements taken
before the data session
minus the mean value
after the data session)
12
the
z-calibration
factor = the certified
value of the step height
standard divided by the
average of the twelve
calibration measurements
13
percent quoted by
interferometer
manufacturer for the
maximum deviation from
linearity of the data
scan over the total scan
range divided by 1 %
such that it is unitless
Nomenclature:
"N" refers to the
test structure number ("1,"
"2," "3,"
etc.),
"X" and "Y"
refer to the platform letter
("A," "B," "C,"
etc.), and
"t" indicates which
data trace ("a," "b,"
or "c").
