Publication List

Gaseous Electronics

  1. R. E. Kennerly, R. J. Van Brunt, and A. C. Gallagher, "High-Resolution Measurement of the Helium 1s2s2 2S Resonance Profile," Physical Review 23, No. 5, pp. 2430-2442 (May 1981).
  2. R. J. Van Brunt, Preface to book entitled "Nonequilibrium Effects in Ion and Electron Transport," Conf. Proc. Sixth Intl. Swarm Seminar, August 2-5, 1989, Webb Institute, Glen Cove, NY, pp. v-xi, J. W. Gallagher, D. F. Hudson, E. E. Kunhardt, and R. J. Van Brunt, Eds., publ. by Plenum Press, New York (Nov 1990).
  3. J. R. Roberts, J. K. Olthoff, R. J. Van Brunt, and J. R. Whetstone, "Measurements on the NIST GEC Reference Cell," Conf. Proceedings of SPIE Symposium on Advanced Techniques for Integrated Circuit Processing, Santa Clara, CA, Oct 1-5, 1990, publ. in "Advanced Techniques for Integrated Circuit Processing," 1392, pp. 428-432, by the Soc. of Photo-optical Instrumentation Engineers, Bellingham WA (Jan 1991).
  4. J. K. Olthoff, R. J. Van Brunt, H. X. Wan, and J. H. Moore, "Electron Attachment to SF6 and SO2,"Proc. 1991 Joint Symposium on Electron and Ion Swarms and Low Energy Electron Scattering, July 18-20, 1991, Gold Coast, Queensland, Australia, Conf. Record publ. by the Australian National University, Canberra, Australia, pp. 25-27 (Jul 1991).
  5. S. B. Radovanov, J. K. Olthoff, and R. J. Van Brunt, "Off-Axis Measurements of Ion Kinetic Energies in RF Plasmas," Proc. of the XX International Conference on Phenomena in Ionized Gases, July 8-12, 1991, Barga, Italy, publ. by Instituto di Fisica Atomica, Pisa, Italy, pp. 835-836 (Jul 1991).
  6. J. K. Olthoff, R. J. Van Brunt, H. X. Wan, J. H. Moore, and J. A. Tossell, "Total Cross Sections for Electron Scattering and Attachment for SF6 and its Electric Discharge By-Products," Proc. of Sixth Intl. Symposium on Gaseous Dielectrics, Sep 23-27, 1990, Knoxville, TN, publ. by Plenum Press, New York City, NY, pp. 19-25 (Oct 1991).
  7. I. Sauers, G. Harman, J. K. Olthoff, and R. J. Van Brunt, "S2F10 Formation by Electrical Discharges in SF6: Comparison of Spark and Corona," Proc. of Sixth Intl. Symposium on Gaseous Dielectrics, Sept. 23-27, 1990, Knoxville, TN, publ. by Plenum Press, New York City, NY, pp. 553-561 (Oct 1991).
  8. R. J. Van Brunt and S. V. Kulkarni, "Influence of Memory on the Statistics of Pulsating Corona," Proc. of the Sixth Intl. Symposium on Gaseous Dielectrics, Sep 23-27, 1990, Knoxville, TN, Plenum Press, New York City, NY, pp. 383-389 (Oct 1991).
  9. R. J. Van Brunt and E. W. Cernyar, "Influence of Phase-to-Phase Memory Propagation on the Stochastic Behavior of AC-Generated Partial Discharges," 1991 Annual Report presented at the Conf. Electrical Insulation and Dielectric Phenomena (CEIDP), Knoxville, TN, Oct 15-18, 1991, publ. by IEEE, New York City, NY, pp. 589-596 (Oct 1991).
  10. R. J. Van Brunt, "Stochastic Properties of Partial-Discharge Phenomena: A Review," IEEE Trans. Electrical Insulation, Special Issue, Digest of Literature on Dielectrics, publ. by IEEE, New York City, NY, pp. 902-948 (Nov 1991).
  11. R. J. Van Brunt, K. L. Stricklett, J. P. Steiner, and S. V. Kulkarni, "Recent Advances in Partial Discharge Measurement Capabilities at NIST," IEEE Trans. on Elec. Insul., publ. by IEEE, New York City, NY, 27, No. 1, pp. 114-129 (Feb 1992).
  12. J. K. Olthoff, J. R. Roberts, R. J. Van Brunt, J. R. Whetstone, M. A. Sobolewski, and S. Djurovic, "Mass Spectromic and Optical Emission Diagnostics for rf Plasma Reactors," Technical Symposium on Microelectronic Processing Integration '91 (SPIE), Society for Photo-Optical Instrumentation Engineers, San Jose, CA, Sep 9-13, 1991, publ. by Soc. of Photo-Optical Instrum. Engineers, Bellingham, WA, pp. 168-178 (Feb 1992).
  13. J. R. Roberts, J. K. Olthoff, M. A. Sobolewski, R. J. Van Brunt, J. R. Whetstone, and S. Djurovic, "Diagnostic Measurements in RF Plasmas for Materials Processing," Proc. of the 8th American Physical Society Topical Conference on Atomic Processes in Plasmas, Portland, ME, August 25-29, 1991, publ. by American Institute of Physics, New York, NY, pp. 157-168 (Jul 1992).
  14. J. K. Olthoff, R. J. Van Brunt, and M. A. Sobolewski, "Ion Kinetic-Energy Distributions and Electrical Measurements in AR/O2 rf Glow Discharges," Proc. Tenth Intl. Conf. on Gas Discharges and Their Applications, Swansea, Wales, Sep 13-18, 1992, pp. 440-443 (Sep 1992).
  15. S. B. Vrhovac, B. M. Jelenkovic, J. K. Olthoff, and R. J. Van Brunt, "Energy Distribution Functions of Argon Ions in Low Current, Diffuse Discharges at High E/N," Proc. Tenth Intl. Conf. on Gas Discharges and Their Applications, Swansea, Wales, Sep 13-18, 1992, pp. 510-512 (Sep 1992).
  16. R. J. Van Brunt and E. W. Cernyar, "Stochastic Analysis of AC-Generated Partial-Discharge Pulses from a Monte-Carlo Simulation," 1992 Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, Victoria, Vancouver Island, British Columbia, Canada, Oct 18-21, 1992, publ. by IEEE, New York City, NY, pp. 427-434 (Oct 1992).
  17. J. K. Olthoff, R. J. Van Brunt, and S. B. Radovanov, "Ion Kinetic-Energy Distributions in Argon rf Glow Discharges," J. Appl. Phys., 72, No. 10, pp. 4566-4574, publ. by American Institute of Physics (Nov 1992).
  18. R. J. Van Brunt and E. W. Cernyar, "System for Measuring Conditional Amplitude, Phase, or Time Distribution for Pulsating Phenomena," J. of Res., Nat. Inst. Stand. and Tech. (U.S.), 97, No. 6, (Nov-Dec 1992).
  19. H.-X. Wan, J. H. Moore, J. K. Olthoff, and R. J. Van Brunt, "Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products," submitted to Plasma Chemistry and Plasma Processing, Plenum Press, NY, 13, No. 1, pp. 1-16 (Mar 1993).
  20. S. Djurvoic, J. R. Roberts, M. A. Sobolewski, and J. K. Olthoff, "Absolute Spatially- and Temporally-Resolved Optical Emission Measurements of rf Glow Discharges in Argon," publ. in J. Res. Nat. Inst. Stand. and Tech. (U.S.), 98, No. 2, pp. 159-180 (Mar-April 1993).
  21. J. K. Olthoff, K. L. Stricklett, R. J. Van Brunt, J.H. Moore, J. A. Tossell, and I. Sauers, "Dissociative Electron Attachment to S2F10, S2OF10, and S202F10," J. of Chemical Physics, 98, No. 12, pp. 9466-9471, publ. by the American Institute of Physics, New York City, NY (Jun 1993).
  22. R. J. Van Brunt and J. K. Olthoff, "Kinetic-Energy Distributions of K+ in Argon and Neon in Uniform Electric Fields," Proc. 8th Intl. Seminar on Electron and Ion Swarms, July 14-17, 1993, Trondheim, Norway, publ. by University of Tronheim, Norwegian Institute of Technology (NTH), Trondheim, Norway, pp. 76-78 (Jul 1993).
  23. J. K. Olthoff and R. J. Van Brunt, "Characterization and Calibration of a BIT/RGA for Use as a Plasma Processing Diagnostic," SEMATECH Technology Transfer Report, 9304161A-XFR, pp. 1-36, publ. by SEMATECH, Austin, TX (Aug 1993).
  24. R. J. Van Brunt and J. T. Herron, "Plasma Chemical Model for Decomposition of SF6 in a Negative Glow Corona Discharge," publ. Royal Swedish Academy of Sciences, Stockholm, Sweden, Physica Scripta, T53, pp. 9-29 (1994).
  25. J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, and M. A. Sobolewski, " The Gaseous Electronics Conference Radio-frequency Reference Cell: A Defined Parallel-plate Radio-frequency System for Experimental and Theoretical Studies of Plasma-processing Discharges," American Institute of Physics, Review of Scientific Instruments, 65, No. 1, pp. 140-154 (Jan 1994).
  26. J. K. Olthoff, R. J. Van Brunt, S. B. Radovanov, J. A. Rees, and R. Surowiec, "Kinetic-Energy Distributions of Ions Sampled from Argon Plasmas in a Parallel-Plate Radio Frequency Reference Cell," J. Appl. Phys., American Institute of Physics, 75, Issue 1, pp. 115-125 (Jan 1994).
  27. J. K. Olthoff, R. J. Van Brunt, S. B. Radovanov, and J. A. Rees, "Use of an Ion Energy Analyzer-Mass Spectrometer to Measure Ion Kinetic-Energy Distributions from RF Discharges in Argon-Helium Gas Mixtures" Institute of Electrical Engineers (IEE) Proceedings-Sci. Meas. Technol., 141, No. 2, pp. 105-110 (Mar 1994).
  28. M. A. Sobolewski and J. K. Olthoff, "Electrical Sensors for Monitoring rf Plasma Sheaths," Proc. Intl. Society for Optical Engineering (SPIE) Symposium on Microelectronic Processes, Sensors, and Controls, Sept. 27-29, 1993, Monterey, CA, 2091, pp. 290-300 (May 1994).
  29. R. J. Van Brunt, "Physics and Chemistry of Partial-Discharge and Corona - Recent Advances and Future Challenges" (1994 Whitehead Memorial Paper) IEEE Transactions on Dielectrics and Electrical Insulation, 1, No. 5, pp. 761-784 (Oct 1994).
  30. R. J. Van Brunt, "Physics and Chemistry of Partial Discharge and Corona - Recent Advances and Future Challenges," IEEE 1994 Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, spon. IEEE Dielectrics and Electrical Insulation Society, Oct 23-26, 1994, Arlington, TX, pp. 29-70 (Jan 1995).
  31. R. J. Van Brunt, T. L. Nelson, and S. L. Firebaugh, "Early Streamer Emission Lightning Protection Systems - Literature Survey and Technical Evaluation," Nat. Inst. of Stand. and Tech., (U.S.), NISTIR 5621, 190 pages (Feb 1995).
  32. S. B. Radovanov, K. Dzierzega, J. R. Roberts, and J. K. Olthoff, "Time-resolved Balmer-alpha Emission from Fast Hydrogen Atoms in Low Pressure, Radio-Frequency Discharges in Hydrogen," Applied Physics Letters, American Institute of Physics, New York, NY, 66, No. 20, pp. 2637-2639, (May 1995).
  33. S. B. Radovanov, R. J. Van Brunt, J. K. Olthoff, and B. M. Jelenkovic, "Ion Kinetics and Symmetric Charge-transfer Collisions in Low-current, Diffuse (Townsend) Discharges in Argon and Nitrogen," Physical Review E, American Physical Society, New York, NY, 51, No. 6, pp. 6036-6046 (Jun 1995).
  34. S. B. Radovanov, J. K. Olthoff, R. J. Van Brunt, and S. Djurovic, "Ion Kinetic-Energy Distributions and Balmer-alpha (Halpha) Excitation in Ar-H2-Radio-Frequency Discharges," J. Appl. Phys., American Institute of Physics, New York, NY, 78, No. 2, pp 746-757 (Jul 1995).
  35. J. K. Olthoff, R. J. Van Brunt, and S. B. Radovanov, "Effect of Electrode Material on Measured Ion Energy Distributions in Radio-Frequency Discharges," American Institute of Physics, Appl. Phys. Lett., 67 (4), pp. 473-475 (Jul 1995).
  36. M.V.V.S. Rao, S. B. Radovanov, R. J. Van Brunt, and J. K. Olthoff, "Kinetic Energy Distribution of Ions Produced from Townsend Discharges in Neon and Argon, "Proc. 19th International Conference on the Physics of Electronic and Atomic Collisions, Jul 26-Aug 1, 1994, Whistler BC, Canada, publ. by Univ. of Western Ontario, p. 392 (Jul 1995).
  37. M.V.V.S. Rao, R. J. Van Brunt, and J. K. Olthoff, "Kinetic Energy Distributions of H+, H2+, and H3+ from a Diffuse Townsend Discharge in H2 at High E/N," Proc. of Abstracts, International Symposium on Electron- and Photon-Molecule Collisions and Swarms, Jul 22-25, 1995, Berkeley, CA, p. H-9 (Jul 1995).
  38. L. G. Christophorou, "Electron Attachment to Excited Molecules," Proc. of Abstracts, International Symposium on Electron- and Photon-Molecule Collisions and Swarms, Jul 22-25, 1995, Berkeley, CA, p. E-1 (Jul 1995).
  39. J. K. Olthoff, R. J. Van Brunt, and S. B. Radovanov, "Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell," J. Res., Nat. Inst. of Stand. and Tech. (U.S.), 100, No. 4, pp. 383-400 (Jul-Aug 1995).
  40. J. K. Olthoff and K. E. Greenberg, "The Gaseous Electronics Conference RF Reference Cell An Introduction," J. Res., Nat. Inst. of Stand. and Tech. (U.S.), 100, No. 4, pp. 327-339 (Jul-Aug 1995).
  41. R. J. Van Brunt and J. W. Gallagher, "Conference Report - Forty-Seventh Annual Gaseous Electronics Conference," J. Res., Nat. Inst. of Stand. and Tech. (U.S.), 100, No. 4, pp. 495-499 (Jul-Aug 1995).
  42. R. J. Van Brunt, J. K. Olthoff, and S. B. Radovanov, "Influence of Electrode Material on Measured Ion Kinetic-Energy Distributions in Radio-Frequency Discharges," Proc. XXII International Conference on Phenomena in Ionized Gases, Jul 31-Aug 5, 1995, Hoboken, NJ, publ. Stevens Institute of Technology, Hoboken, NJ, pp. 29-30 (Aug 1995).
  43. L. G. Christophorou, R. J. Van Brunt, and J. K. Olthoff, "Fundamental Processes in Gas Discharges,"Proc. Eleventh International Conference on Gas Discharges and Their Applications, Sep 11-15, 1995, Tokyo, Japan, I, pp. I/536-548 (Sep 1995).
  44. R. J. Van Brunt, J. K. Olthoff, and S. B. Radovanov, "Kinetic-Energy Distributions of Ions Sampled from Radio-Frequency Discharges in Helium, Nitrogen, and Oxygen," Proc. Eleventh International Conference on Gas Discharges and Their Applications, Sep 11-15, 1995, Tokyo, Japan, I, pp. I/486-489 (Sep 1995).
  45. H. H. Hwang, J. K. Olthoff, R. J. Van Brunt, S. B. Radovanov, and M. J. Kushner, "Evidence for Inelastic Processes for N3+ and N4+ from Ion Energy Distributions in He/N2 Radio Frequency Glow Discharges," J. of Appl. Phys., 79, (1), pp. 93-98 (Jan 1996).
  46. R. Foest, J. K. Olthoff, R. J. Van Brunt, E. C. Benck, and J. R. Roberts, "Optical and Mass Spectrometric Investigations of Ions and Neutral Species in SF6 Radio-Frequency Discharges," Physical Review E, publ. American Physical Society, New York, NY, 54, No. 2, pp. 1876-1887 (Aug 1996).
  47. J. Bretagne, T. Simko, G. Gousset, M.V.V.S. Rao, R. J. Van Brunt, Y. Wang, J. K. Olthoff, B. L. Peko, and R. L. Champion, "Distributions of H+, H2+, H3+ Ions in Townsend Discharge and Determination of their Collision Cross Sections," ESCAMPIG 96/Europhysics Conference Abstracts, Thirteenth European Sectional Conf. on the Atomic and Molecular Physics of Ionised Gases, Aug 27-30, 1996, Poprad, Slvakia, publ. European Physical Soc., 20 E, pp. 115-116 (Sep 1996).
  48. L. G. Christophorou, J. K. Olthoff, and M.V.V.S. Rao, "Electron Interactions with CF4," Nat. Inst. of Stand. and Tech. (U.S.), J. Phys. Chem. Ref. Data (JPCRD), publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 25, No. 5, pp. 1341-1388 (Sep 1996).
  49. L. G. Christophorou, "The Dependence of the Thermal Electron Attachment Rate Constant in Gases and Liquids on the Energy Position of the Electron Attaching State," Zeitschrift fur Physikalische Chemie, Bd. (Intl. J. of Physical Chemistry and Chemical Physics), German Physical Society, publ. R. Oldenbourg Verlag, Mnchen, 195 S, pp. 195-215 (Nov 1996).
  50. M.V.V.S. Rao, R. J. Van Brunt, and J. K. Olthoff, "Resonant Charge Exchange and the Transport of Ions at High Electric-Field to Gas-Density Ratios (E/N) in Argon, Neon, and Helium," Physical Review E, publ. American Physical Society, New York, NY, 54, No. 5, pp. 5641-5656 (Nov 1996).
  51. R. J. Van Brunt and P. Von Glahn, "Improved Monte-Carlo Simulator of Partial Discharge," 1996 Annual Report - Conference on Electrical Insulation and Dielectric Phenomena (CEIDP), Oct 20-23, 1996, San Francisco, CA, spon. IEEE Dielectrics and Electrical Insulation Society, 96CH35985, II, pp. 504-509 (Oct 1996).
  52. L. G. Christophorou, J. K. Olthoff, and Y. Wang, "Electron Interactions with CCl2F2," J. Phys. Chem. Ref. Data, publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 26, No. 5, pp. 1205-1237 (1997).
  53. L. G. Christophorou, J. K. Olthoff, and M.V.V.S. Rao, "Electron Interactions with CHF3," J. Physical and Chemical Reference Data (JPCRD), 26, No. 1, pp. 1-15, publ. by the American Chemical Society and the American Institute of Physics for Nat. Inst. of Standards and Technology (Jan 1997).
  54. R. J. Van Brunt, P. Von Glahn, and T. Las, "Anomalous Stochastic Behavior of Partial Discharge on Aluminum Oxide Surfaces," J. of Applied Physics, American Institute of Physics, NY, 81 (2), pp. 840-852 (Jan 1997).
  55. J. K. Olthoff, "Plasma Diagnostics on the Gaseous Electronics Conference Radio-Frequency Reference Cell," Proc. Frontiers in Low Temperature Plasma Diagnostics II, Feb 17-21, 1997, Bad Honnef, Germany, publ. Arbeitsgermeinschaft Plasmaphysik (APP), pp. 47-56 (Feb 1997).
  56. Y. Wang and R. J. Van Brunt, "Calculation of Electron Transport in Ar/N2 and He/Kr Gas Mixtures-Implications for Validity of the Blanc's Law Method," Physics of Plasmas, publ. American Inst. of Physics, NY, 4, No. 3, pp. 551-554 (Mar 1997).
  57. L. G. Christophorou, J. K. Olthoff, and Y. Wang, "Electron Interactions with CCl2F2," Proc. XXIII Intl. Conference on Phenomena in Ionized Gases (ICPIG), July 17-22, 1997, Toulouse, France, 1, pp. I/68-69 (Jul 1997).
  58. M.V.V.S. Rao, J. K. Olthoff, L. G. Christophorou, and R. J. Van Brunt, "Negative Ion Kinetic-Energy Distributions and Ion-Neutral Reactions in O2 and CO2 Townsend Discharges at High E/N," Intl. Symp. on Electron-Molecule Collisions and Ion and Electron Swarms, Jul 19-22, 1997, Engelberg, Switzerland, publ. Inst. of Physical Chemistry, Univ. of Fribourg, Switzerland, pp. P60/1-2 (Jul 1997).
  59. M.V.V.S. Rao, R. J. Van Brunt, and J. K. Olthoff, "Kinetic-Energy Distributions of Positive Ions Produced in Townsend Discharges of Oxygen at High Electric Field-to-Gas Density Ratios," Intl. Symp. on Electron-Molecule Collisions and Ion and Electron Swarms, Jul 19-22, 1997, Engelberg, Switzerland, publ. Inst. of Physical Chemistry, Univ. of Fribourg, Switzerland, pp. P61/1-2 (Jul 1997).
  60. M.V.V.S. Rao, J. K. Olthoff, and R. J. Van Brunt, "Translational Kinetic-Energy Distributions of Positive Ions Produced in Townsend Discharges of SF6 at High Electric Field-To-Gas Density Ratios (E/N)," XX Intl. Conf. on the Physics of Electronic and Atomic Collisions (ICPEAC), Jul 23-29, 1997, Vienna, Austria, publ. Walter de Gruyter & Co., Berlin, Germany, 2, MO203, 1 page (Jul 1997).
  61. M.V.V.S. Rao, J. K. Olthoff, and R. J. Van Brunt, "Negative Ion-Energy Distributions and Ion-Neutral Reactions in SF6 Townsend Discharges at High Electric Field-To-Gas Density Ratios (E/N)," XX Intl. Conf. on the Physics of Electronic and Atomic Collisions (ICPEAC), Jul 23-29, 1997, Vienna, Austria, publ. Walter de Gruyter & Co., Berlin, Germany, 2, MO202, 1 page (Jul 1997).
  62. L. G. Christophorou, J. K. Olthoff, and R. J. Van Brunt, "Sulfur Hexafluoride and the Electric Power Industry," IEEE Electrical Insulation Magazine, 13, No. 5, pp. 20-24 (Sep/Oct 1997).
  63. Y. Wang, "New Method for Measuring Statistical Distributions of Partial Discharge Pulses," J. Res., Natl. Inst. Stand. Technol. (U.S.), 102, pp. 569-576 (Sep/Oct 1997).
  64. Y. Wang, X. Han, R. J. Van Brunt, J. Horwath, and D. Schweikart, "Digital Recording and Analysis of Positive Partial Discharges in Air," Proc. XII Intl. Conference on Gas Discharges and their Applications, Oct 8-12, 1997, Greifswald, Germany, pp. 1-256 to 1-259 (Nov 1997).
  65. L. G. Christophorou, J. K. Olthoff, and D. S. Green, "Gases for Electrical Insulation and Arc Interruption: Possible Present and Future Alternatives to Pure SF6," Natl. Inst. of Stand. and Technol. (U.S.), Tech. Note 1425, 44 pages (Nov 1997).
  66. X. Han and Y. Wang, "Characterization of Pulsating Partial Discharges in SF6-N2 Mixture," 1997 IEEE Annual Report (0-7803-3851-0), Conf. on Electrical Insulation and Dielectric Phenomena, Oct 19-22, 1997, Minneapolis, MN, pp. 538-541 (Nov 1997).
  67. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with C2F6," J. Phys. Chem. Ref. Data (JPCRD), publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 27, No. 1, pp. 1-29 (1998).
  68. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with C3F8," J. Phys. Chem. Ref. Data (JPCRD), publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 27, No. 5, pp. 889-913 (1998).
  69. Y. Wang, R. J. Van Brunt, and J. K. Olthoff, "Mass Spectrometric Measurement of Molecular Dissociation in Inductively-coupled Plasmas," J. Appl. Phys., publ. Amer. Inst. of Physics, 83, No. 2, pp. 703-708 (Jan 1998).
  70. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with Plasma Processing Gases: CF4, CHF3, C2F6, and C3F8," Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics, Jan 25-30, 1998, Going/Kitzbuhel, Austria, publ. Institut fur Ionenphysik der Universitat Innsbruck, Austria, pp. 3-3 to 3-6 (Jan 1998).
  71. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with Plasma Processing Gases," Natl. Inst. Stand. Technol (U.S.), Spec. Publ. 926, Proc. 1997 Intl. Conference on Atom and Molecular Data and Their Applications, Sep 29-Oct 2, 1997, Gaithersburg, MD, ed. W. L. Wiese and P. J. Mohr, pp 8-11 (Aug 1998).
  72. S. G. Walton, R. L. Champion, and Y. Wang, "Negative Ion Emission from a Stainless Steel Surface Due to Positive Ion Collisions," J. Appl. Physics, publ. Amer. Inst. of Physics, 84, No. 3., pp. 1706-1707 (Aug 1998).
  73. Y. Wang, L. G. Christophorou, and J. K. Verbrugge, "Effect of Temperature on Electron Attachment To and Negative Ion States of CCl2F2," J. of Chemical Physics, publ. Amer. Inst. of Physics, 109, No. 19, pp. 8304-8310 (Nov 1998).
  74. L. G. Christophorou and J. K. Olthoff, "Applications of Electron-Interaction Reference Data to the Semiconductor Industry," Characterization and Metrology for ULSI Technology: 1998 Intl. Conf (CP449), Mar 23-27, 1998, Gaithersburg, MD, publ. Amer. Inst. of Physics, Woodbury, NY, pp. 437-441 (Dec 1998).
  75. Y. Wang, L. G. Christophorou, J. K. Olthoff, and J. K. Verbrugge, "Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF3 and its Mixtures with Argon," Proc. Eighth Intl. Symp. on Gaseous Dielectrics, publ. Kluwer Academic/Plenum Press, NY, Jun 2-5, 1998, Virginia Beach, VA, pp. 39-44 (Dec 1998).
  76. M.V.V.S. Rao and J. K. Olthoff, "Ion-Molecule Reactions and Ion Kinetics in DC Townsend Discharges in Dielectric Gases," Proc. Eighth Intl. Symp. on Gaseous Dielectrics, publ. Kluwer Academic/Plenum Press, NY, Jun 2-5, 1998, Virginia Beach, VA, pp. 31-37 (Dec 1998).
  77. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with Plasma Processing Gases: An Update for CF4, CHF3, C2F6, and C3F8," J. Phys. Chem. Ref. Data (JCPRD), publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 28, No. 4, pp. 967-982 (1999).
  78. G. D. Cooper, J. E. Sanabia, J. H. Moore, J. K. Olthoff, and L. G. Christophorou, "Total Electron Scattering Cross Section for Cl2," J. of Chemical Physics, Amer. Inst. of Physics, 110, No. 1, pp. 682-683 (Jan 1999).
  79. S. G. Walton, J. C. Tucek, R. L. Champion, and Y. Wang, "Low Energy, Ion-Induced Electron and Ion Emission from Stainless Steel: The Effect of Oxygen Coverage and the Implications for Discharge Modeling," J. Appl. Physics, Amer. Inst. of Physics, 85, No. 3, pp. 1832-1837 (Feb 1999).
  80. M.V.V.S Rao, R. J. Van Brunt, and J. K. Olthoff, "Kinetic-energy Distributions of Positive and Negative Ions in Townsend Discharges in Oxygen," Physical Review E, publ. Amer. Inst. of Physics, 59, No. 4, pp. 4565-4572 (Apr 1999).
  81. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with Cl2," J. Phys. Chem. Ref. Data (JCPRD), publ. Amer. Chemical Soc. and Amer. Inst. of Physics, 28, No. 1, pp. 131-169 (Apr 1999).
  82. M. A. Sobolewski, J. K. Olthoff, and Y. Wang, "Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor," J. Appl. Physics, Amer. Inst. of Physics, 85, No. 8, pp. 3966-3975 (Apr 1999).
  83. Y. Wang and J. K. Olthoff, "Ion Energy Distributions in Inductively Coupled Radio-Frequency Discharges in Argon, Nitrogen, Oxygen, Chlorine, and Their Mixtures," J. Appl. Phys., Amer. Inst. of Physics, NY, 85, No. 9, pp. 6358-6365 (May 1999).
  84. Y. Wang, L. G. Christophorou, J. K. Olthoff, and J. K. Verbrugge, "Electron Drift and Attachment in CHF3 and its Mixtures with Argon," Chemical Physics Letters, Elsevier Science Publishing, Amsterdam, The Netherlands, 304, pp. 303-308 (May 1999).
  85. L. G. Christophorou and J. K. Olthoff, "Electron Collision Cross Sections Derived from Critically Assessed Data," Proc. XXIV Intl. Conf. on the Physics of Ionized Gases (ICPIG), Jul 11-16, 1999, Warsaw, Poland, 1, publ. Inst. of Plasma Physics and Laser Microfusion, Warsaw, Poland, pp. 49-50 (Jul 1999).
  86. J. K. Olthoff and M.V.V.S. Rao, "Negative Ion-Neutral Reactions in Townsend Discharges," Proc. Intl. Symposium on Electron-Molecule Collisions and Swarms, Jul 18-20, 1999, Tokyo, Japan, spons. Yamaguchi Univ. and Tokyo Inst. of Technology, et al, pp. 23-26 (Jul 1999).
  87. J. K. Olthoff and Y. Wang, "Studies of Ion Bombardment in High Density Plasmas Containing CF4," J. Vacuum Science Technol. A, publ. Amer. Vacuum Society, NY, NY, 17, No. 4, pp. 1552-1555 (Jul/Aug 1999).
  88. M.-C. Bordage, P. Segur, L. G. Christophorou, and J. K. Olthoff, "Boltzmann Analysis of Electron Swarm Parameters in CF4 Using Independently Assessed Electron-Collision Cross Sections," J. Appl. Physics, Amer. Inst. of Physics, 86, No. 7, pp. 3558-3566 (Oct 1999).
  89. B. L. Peko, I. V. Dyakov, R. L. Champion, M.V.V.S. Rao, and J. K. Olthoff, "Ion-molecule Reactions and Ion Energies in CF4 Discharge," Physical Review E, Amer. Physical Soc., 60, No. 6, pp. 7449-7456 (Dec 1999).
  90. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with CF3I," J. Phys. Chem. Ref. Data (JPCRD), publ. Amer. Inst. of Phys. for Natl. Inst. Stand. Technol., 29, No. 4, pp. 553-570 (2000).
  91. R. J. Van Brunt, T. L. Nelson, and K. L. Stricklett, "Early Streamer Emission Lightning Protection Systems: An Overview," IEEE Electrical Insulation Magazine, 16, No. 1, pp. 5-24 (Jan/Feb 2000).
  92. Y. Wang, E. C. Benck, M. Misakian, M. Edamura, J. K. Olthoff, "Time-resolved Measurements of Ion Energy Distributions and Optical Emissions in Pulsed Radio-Frequency Discharges," J. Appl. Physics, 87, No. 5, pp. 2114-2121 (Mar 2000).
  93. M. Misakian and Y. Wang, "Calculation of Ion Energy Distributions from Radio Frequency Plasmas Using a Simplified Kinetic Approach," J. Appl. Phys., publ. Amer. Inst. of Physics, 87, No. 8, pp. 3646-3653 (Apr 2000).
  94. A. N. Goyette, Y. Wang, and J. K. Olthoff, "Inductively Coupled Plasmas in Low Global Warming Potential Gases," J. Physics D: Appl. Phys., 33, (printed in the UK) pp. 2004-2009 (Aug 2000).
  95. Y. Wang, A. N. Goyette, M. Misakian, and J. K. Olthoff, "Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar," Proc. XIII Intl. Conf. on Gas Discharges and Their Applications, Sep 3-8, 2000, Glasgow, UK, pp. 655-658 (Sep 2000).
  96. M. Misakian, E. Benck, and Y. Wang, "Time Evolution of Ion Energy Distributions and Optical Emission in Pulsed Inductively Coupled Radio Frequency Plasmas," J. Appl. Phys., 88, No. 8, pp. 4510-4516 (Oct 2000).
  97. L. G. Christophorou and J. K. Olthoff, "Electron Collision Data for Plasma-Processing Gases," book chapter in Advances in Atomic, Molecular, and Optical Physics, Eds. - B. Bederson and H. Walther, Academic Press, San Diego, CA, 44, pp. 59-98 (Nov 2000).
  98. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with Excited Atoms and Molecules," book chapter in Advances in Atomic, Molecular, and Optical Physics, Eds. B. Bederson and H. Walther, Academic Press, San Diego, CA, 44, pp. 153-293 (Nov 2000).
  99. Y. Wang, M. Misakian, A. N. Goyette, and J. K. Olthoff, "Ion Fluxes and Energies in Inductively Coupled Radio-Frequency Discharges Containing CHF3," J. Appl. Phys., Amer. Inst. of Physics, 88, No. 10, pp. 5612-5617 (Nov 2000).
  100. A. N. Goyette, Y. Wang, M. Misakian, and J. K. Olthoff, "Ion fluxes and Energies in Inductively Coupled Radio-Frequency Discharges Containing C2F6 and c-C4F8, J. Vac. Sci. Technol. A, American Vacuum Society, 18, No. 6, pp. 2785-2790 (Nov/Dec 2000).
  101. A. N. Goyette, Y. Wang, and J. K. Olthoff, "Comparison of the Identities, Fluxes, and Energies of Ions Formed in High Density Fluorocarbon Discharges," Proc. of Characterization and Metrology for ULSI Technology 2000 Intl. Conf., Jun 26-29, 2000, Gaithersburg, MD, pp. 283-242 (2001).
  102. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with c-C4F8," Natl. Inst. Stand. Technol. (U.S.), J. Phys. Chem. Ref. Data (JPCRD), publ. by Amer. Inst. of Physics, 30, No. 2, pp. 449-473 (2001).
  103. L. G. Christophorou and J. K. Olthoff, "Electron Attachment Cross Sections and Negative Ion States of SF6," International Journal of Mass Spectrometry, 205, publ. Elsevier Science, Amsterdam, Netherlands, pp. 27-41 (2001).
  104. A. N. Goyette, J. de Urquijo, Y. Wang, L. G. Christophorou, and J. K. Olthoff, "Electron Transport, Ionization, and Attachment Coefficients in C2F4 and C2F4/Ar Mixtures," J. Chemical Physics, publ. Amer. Inst. of Physics, 114, No. 20, pp. 8932-8937 (May 2001).
  105. A. N. Goyette, J. de Urquijo, Y. Wang, L. G. Christophorou, and J. K. Olthoff, "Electron, Transport, Ionization and Attachment Coefficients in C2F4 and C2F4/Ar Mixtures," Summary Paper, Proc. Intl. Symp. on Electron-Molecule Collisions and Swarms, Jul 14-16, 2001, Lincoln, NE, pp. 128-129 (Jul 2001).
  106. L. G. Christophorou and J. K. Olthoff, "Electron Interactions with c-C4F8," (SUMMARY PAPER), Proc. XXVI Intl. Conf. on Phenomena in Ionized Gases (ICPIG), Jul 17-22, 2001, Nagoya, Japan, 3, pp. 19P36 (Jul 2001).
  107. A. N. Goyette, Y. Wang, J. K. Olthoff, "Ion Compositions and Energies in Inductively Coupled Plasmas Containing SF6, J. Vacuum Sci. Technol. A, 19, No. 4, pp. 1294-1297 (Jul/Aug 2001).

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